Surface roughness of aluminum nitride epilayers prepared by magnetron sputtering
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F14%3APU108877" target="_blank" >RIV/00216305:26220/14:PU108877 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Surface roughness of aluminum nitride epilayers prepared by magnetron sputtering
Original language description
AlN films were deposited by magnetron sputtering on the sapphire substrates. The dependence of films morphology on the substrate temperature is defined. The film is represented by well textured areas for higher substrate temperature during deposition process. Adhesion strength of particles and substrate depends on temperature. Increasing of temperature by heating the substrate is important parameter which intences the interaction in interface at the near-surface area.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
JA - Electronics and optoelectronics
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Proceedings of the 20th conference. Volume 3
ISBN
978-80-214-4922-0
ISSN
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e-ISSN
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Number of pages
5
Pages from-to
120-124
Publisher name
LITERA Brno
Place of publication
Brno
Event location
Brno
Event date
Apr 24, 2014
Type of event by nationality
CST - Celostátní akce
UT code for WoS article
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