Integration of one-dimensional gas sensitive nanostructures grown via chemical vapor deposition into microdevices

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F18%3APU127562" target="_blank" >RIV/00216305:26220/18:PU127562 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Integration of one-dimensional gas sensitive nanostructures grown via chemical vapor deposition into microdevices
Original language description
Nanostructures (NS), e.g., based on metal oxides, are attractive in gas sensors because they proved to enhance the functionality of these devices, providing better sensitivity, stability, and selectivity. Further enhancement of the functionality of nanostructures is also known to be achieved by electronic and/or chemical sensitization via the surface modification with second-phase materials (e.g., catalytic nanoparticles with sizes less than 10 nm). The formation of NSs is traditionally achieved via liquid- or vapor-phase routes, with the vaporphase routes (e.g., CVD) having shown advantages that include greater purity, the ability to generate NSs in continuous rather than batch mode and higher throughputs. Thus, in this work, we will discuss the use of CVD and aerosol assisted (AA) CVD to synthesize nonmodified and modified NSs, demonstrating that the selective synthesis of NSs, their functionalization and their integration into silicon- or polymer-based microsystems can take place in a single proces
Czech name
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Czech description
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2018
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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