COMPARATIVE STUDY OF THE MeV ION CHANNELING IMPLANTATION INDUCED DAMAGE IN 6H-SiC BY THE ITERATIVE PROCEDURE AND PHENOMENOLOGICAL CSIM COMPUTER CODE
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F22%3APU146898" target="_blank" >RIV/00216305:26220/22:PU146898 - isvavai.cz</a>
Result on the web
<a href="https://ntrp.vinca.rs/2022_2/Contents2022_2.html" target="_blank" >https://ntrp.vinca.rs/2022_2/Contents2022_2.html</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.2298/NTRP2202128G" target="_blank" >10.2298/NTRP2202128G</a>
Alternative languages
Result language
angličtina
Original language name
COMPARATIVE STUDY OF THE MeV ION CHANNELING IMPLANTATION INDUCED DAMAGE IN 6H-SiC BY THE ITERATIVE PROCEDURE AND PHENOMENOLOGICAL CSIM COMPUTER CODE
Original language description
Due to its unique material properties, such as extreme hardness and radiation resistance, silicon carbide has been used as an important construction material for environments with extreme conditions, like those present in nu clear reactors. As such, it is constantly exposed to energetic particles (e. g., neutrons) and consequently subjected to gradual crystal lattice degradation. In this article, the 6H-SiC crystal damage has been simulated by the implantation of 4 MeV C3+ ions in the (0001) axial direction of a single 6H-SiC crystal to the ion fluences of 1.359.10(15) cm(-2), 6.740.10(15) cm(-2), and 2.02.10(16) cm(-2). These implanted samples were subsequently analyzed by Rutherford and elastic backscattering spectrometry in the channeling orientation (RBS/C & EBS/C) by the usage of 1 MeV protons. Obtained spectra were analyzed by channeling simulation phenomenological computer code (CSIM) to obtain quantitative crystal damage depth profiles. The difference between the positions of damage profile maxima obtained by CSIM code and one simulated with stopping and range of ions in matter (SRIM), a Monte Carlo based computer code focused on ion implantation simulation in random crystal direction only, is about 10 %. Therefore, due to small profile depth shifts, the usage of the iterative procedure for calculating crystal damage depth profiles is proposed. It was shown that profiles obtained by iterative procedure show very good agreement with the ones obtained with CSIM code. Addition ally, with the introduction of channeling to random energy loss ratio the energy to depth profile scale conversion, the agreement with CSIM profiles becomes excellent.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
20305 - Nuclear related engineering; (nuclear physics to be 1.3);
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2022
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
NUCL TECHNOL RADIAT
ISSN
1451-3994
e-ISSN
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Volume of the periodical
37
Issue of the periodical within the volume
2
Country of publishing house
RS - THE REPUBLIC OF SERBIA
Number of pages
10
Pages from-to
128-137
UT code for WoS article
000896021500006
EID of the result in the Scopus database
2-s2.0-85142457236