Plasma Enhanced Chemical Vapour Deposition of SiO2-Like Films: Monitoring and Optimization of the Process
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F12%3APU105242" target="_blank" >RIV/00216305:26310/12:PU105242 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Plasma Enhanced Chemical Vapour Deposition of SiO2-Like Films: Monitoring and Optimization of the Process
Original language description
This work focuses on high density thin films deposited by PECVD using hexamethyldisiloxane precursor. Optical emission spectroscopy was used for plasma diagnostics. Oxygen transmission rate and infrared spectra of deposited layers were measured. Optimalexperimental conditions for low carbon content layers and layers with good barrier properties were determined.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
AC - Archaeology, anthropology, ethnology
OECD FORD branch
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Result continuities
Project
<a href="/en/project/DF11P01OVV004" target="_blank" >DF11P01OVV004: Plasma chemical processes and technologies for conservation of archaeological metallic objects</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2012
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Studentská odborná konference Chemie je život 2012, Sborník příspěvků
ISBN
978-80-214-4644-1
ISSN
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e-ISSN
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Number of pages
4
Pages from-to
405-408
Publisher name
Vysoké učení technické v Brně. Fakulta chemická
Place of publication
Brno
Event location
Brno
Event date
Dec 7, 2012
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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