Optical properties of a-SiC:H films deposited by continuous wave and pulsed plasmas

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F16%3APU122520" target="_blank" >RIV/00216305:26310/16:PU122520 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Optical properties of a-SiC:H films deposited by continuous wave and pulsed plasmas
Original language description
Thin films in a form of hydrogenated amorphous carbon-silicon alloys (a-SiC:H) can be prepared from organosilicon monomers using plasma-enhanced chemical vapor deposition (PECVD). The a-SiC:H films may have various optical properties with application potential. Optical films of controllable properties are essential for optical and optoelectronic devices as barrier, anti-scratch, biocompatible, transparent, antireflective, or dielectric coatings, and optical filters. We deposited a-SiC:H films from tetravinylsilane monomer at different powers using continuous wave (10-70 W) and pulsed (2-150 W) plasmas (PECVD). In situ phase-modulated spectroscopic ellipsometer (UVISEL, Jobin-Yvon) was used to determine the film thickness and optical properties (refractive index, extinction coefficient) ranging 250-830 nm. The deposition rate for a-SiC:H films varied from 82 to 262 nm/min as a function of power and was compared for continuous wave and pulsed plasmas. The dispersion curves for refractive index and extin
Czech name
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Czech description
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Project
<a href="/en/project/GA16-09161S" target="_blank" >GA16-09161S: Synthesis of multifunctional plasma polymers for polymer composites without interfaces</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2016
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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