Adhesion and Mechanical Properties of a-CSi:H Thin Films Prepared from Tetravinylsilane Monomer by Plasma Polymerization
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F18%3APU129094" target="_blank" >RIV/00216305:26310/18:PU129094 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Adhesion and Mechanical Properties of a-CSi:H Thin Films Prepared from Tetravinylsilane Monomer by Plasma Polymerization
Original language description
The adhesion of the thin film to the substrate and mechanical properties of this film are some of the most important and crucial attribute in determining the thin film's application possibilities. Thin films with controlled adhesion are essential as barrier, anti-scratch, wear-resistant, transparent and antireflective coatings for surface modified materials. The greatest potential of this research for industrial applications is in glass-fiber-reinforced polymer composites without sharp interfaces. In this study, hydrogenated amorphous silicon-carbon (a-CSi:H) thin films were studied from the point of adhesion to the silicon substrate. Silicon wafers were pretreated with argon plasma (5.7 Pa, 10 sccm, 5 W, 10 min) using continuous wave to reach reproducible thin film adhesion. Thin films were deposited by plasma-enhanced chemical vapor deposition (PECVD) from pure tetravinylsilane (TVS) monomer (2.7 Pa, 3.8 sccm), employing a radiofrequency (RF) helical coupling system, using a pulsed regime with effec
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
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OECD FORD branch
10403 - Physical chemistry
Result continuities
Project
<a href="/en/project/GA16-09161S" target="_blank" >GA16-09161S: Synthesis of multifunctional plasma polymers for polymer composites without interfaces</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2018
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů