Study of self-masking nanostructuring of boron doped diamond films by RF plasma etching

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26620%2F19%3APU133416" target="_blank" >RIV/00216305:26620/19:PU133416 - isvavai.cz</a>
Result on the web
<a href="https://www.sciencedirect.com/science/article/pii/S0042207X18324588?via%3Dihub" target="_blank" >https://www.sciencedirect.com/science/article/pii/S0042207X18324588?via%3Dihub</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.vacuum.2019.108954" target="_blank" >10.1016/j.vacuum.2019.108954</a>

Result language
angličtina
Original language name
Study of self-masking nanostructuring of boron doped diamond films by RF plasma etching
Original language description
The surface nanostructuring of boron doped diamond (BDD) can further enhance its unique properties e.g. in electrochemical sensing, photoelectrochemical cells, field emission devices and various kinds of sensors. Here we present an investigation of plasmatic nanostructuring of BDD films without use of a time-consuming masking process. RF plasma technique was used to etch surface nanostructures with dimensions ranging from tenths to hundreds of nm in width and height. The size and shape of achieved diamond nanostructures were influenced only by applied etching parameters. We found that the etched carbon is re-deposited in an amorphous form creating a mask and this self-masking process is responsible for the final shape of obtained structures. Therefore, this technique is effectively controllable by changing plasma power, gas type and re-deposition of masking material. Utilization of various gas types, pressures and RF powers revealed the physical type of etching to be dominant over the chemical at both high and low energy ions. The nanostructured surfaces were then observed and characterized by SEM and Raman Spectroscopy to investigate the nanostructures dimensions and to confirm the remaining diamond quality.
Czech name
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Czech description
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Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
21001 - Nano-materials (production and properties)

Project
<a href="/en/project/FV10477" target="_blank" >FV10477: Combined Plasma Source Technology for Processing of Advanced Coatings</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2019
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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