Plasma FIB artefact-free milling using TRUE X sectioning technique
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F01733214%3A_____%2F17%3AN0000002" target="_blank" >RIV/01733214:_____/17:N0000002 - isvavai.cz</a>
Result on the web
<a href="http://www.eu-f-n.org/workshop/programme/" target="_blank" >http://www.eu-f-n.org/workshop/programme/</a>
DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Plasma FIB artefact-free milling using TRUE X sectioning technique
Original language description
The Focused Ion Beam (FIB) and the Scanning Electron Microscopy (SEM) are essential techniques for failure analysis of microelectronic devices or material science. For larger cross sections with dimensions exceeding 100 μm, use of Xe plasma FIB is much more convenient due to FIB milling rate increased approximately by a factor of 50. However, two parameters of the cross-sectioning are crucial – the fast milling rate and the high quality of the surface, with no damage or artefacts. While protection layer deposition and multi-tilt stage bring significantly reduced curtaining effect on the most of samples, there are still some materials which exhibit quite poor cross-section quality due to the effect of FIB-induced artefacts (ripples, stairs, terraces). Therefore we propose simple method (TRUE X-sectioning) of the beam shape modification for quality increase of FIB milling on these difficult samples.
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
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OECD FORD branch
21002 - Nano-processes (applications on nano-scale); (biomaterials to be 2.9)
Result continuities
Project
<a href="/en/project/TE01020233" target="_blank" >TE01020233: Advanced Microscopy and Spectroscopy Platform for Research and Development in Nano and Microtechnologies - AMISPEC</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2017
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů