AFM Study of Al2O3 Thin Films Prepared by Plasma Oxidation
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F44555601%3A13430%2F00%3A00000560" target="_blank" >RIV/44555601:13430/00:00000560 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
AFM Study of Al2O3 Thin Films Prepared by Plasma Oxidation
Original language description
The surface structure features of Al2O3 thin films, which were prepared by plasma oxidation of aluminium thin films, were observed using atomic force microscopy (AFM). The alumina thin films were prepared at different sample bias voltages for demonstration of the preparation condition influence. It was found that the value of sample bias voltage plays an indispensable role for surface structure of the alumina film. Structural properties of the Al2O3 films could be affected during preparation due to plasma particle bombardment. The thickness of Al, Al-Al2O3, and Al-Al2O3-Al structures was derived from the AFM images of surfaces with a mechanical scratch.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
<a href="/en/project/OC%20527.50" target="_blank" >OC 527.50: Polymer Thin Films Study by AFM and Improvement of Plasma Diagnostics Methods</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2000
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Le Vide: science, technique et application
ISSN
1266-0167
e-ISSN
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Volume of the periodical
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Issue of the periodical within the volume
295
Country of publishing house
XX - stateless person
Number of pages
3
Pages from-to
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UT code for WoS article
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EID of the result in the Scopus database
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