Influence of Plasma Parameters on Structual Properties of Al2O3 Films Prepared by Plasma Oxidation

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F44555601%3A13430%2F00%3A00000568" target="_blank" >RIV/44555601:13430/00:00000568 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Influence of Plasma Parameters on Structual Properties of Al2O3 Films Prepared by Plasma Oxidation
Original language description
The aim of the work is to study a correlation between plasma parameters of argon/oxygen discharge on one hand and surface structure features of alumina films on the other hand. Experiments were performed in a system for plasma-chemical surface modification of thin films. In our experiments we used a DC discharge to generate the plasma. The main diagnostic techniques applied to determine the plasma parameters were optical and probe diagnostics. A thin film surface analysis was carried out by means of atomic force microscopy (AFM) technique. The plasma oxidation process is sensitive to the nature of the plasma. It is defined by such parameters as argon/oxygen ratio, pressure and dissipated power. Different discharge parameters were tested for the plasmaoxidation process. The alumina thin films were prepared at different sample bias voltages. The surface structure of alumina films depends on preparation conditions. A comparison of the results obtained under different plasma oxidation con
Czech name
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Czech description
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Publication year
2000
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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