Study of Argon/Oxygen Plasma Used for Creation of Aluminium Oxide Thin Films

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F44555601%3A13430%2F99%3A00000557" target="_blank" >RIV/44555601:13430/99:00000557 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Study of Argon/Oxygen Plasma Used for Creation of Aluminium Oxide Thin Films

Original language description

The aim of this work was to investigate the structure of insulating layers grown in a low temperature plasma. The experiments were performed in a system for plasma-chemical surface modification of thin films. In our experiments we used a DC discharge orcapacitively coupled RF discharge to generate the plasma in various oxygen/argon mixtures. The main diagnostic techniques applied to determine plasma parameters were the optical and probe diagnostics. The combination of the above mentioned diagnostic techniques enabled to evaluate the influence of plasma parameters during plasma oxidation upon the quality of the aluminium oxide films

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

<a href="/en/project/OK%20401" target="_blank" >OK 401: Development of Plasma-based Products and Processes</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

1999

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Superficies Y Vacio

ISSN

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e-ISSN

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Volume of the periodical

9

Issue of the periodical within the volume

Diciembre

Country of publishing house

XX - stateless person

Number of pages

4

Pages from-to

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UT code for WoS article

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EID of the result in the Scopus database

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