Surface Properties of the Thin SnO2 Layers Prepared by Plasma Oxidation

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F44555601%3A13430%2F01%3A00001468" target="_blank" >RIV/44555601:13430/01:00001468 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Surface Properties of the Thin SnO2 Layers Prepared by Plasma Oxidation
Original language description
Development of gas sensors in last few years has shown an important interest in thin tin oxide films. The SnO2 is one of the most widely used materials for gas sensor applications due to their properties and their good perfomance for a detection of oxidable gases. In this work, we have studied surface properties of SnO2 thin films produced by thermal evaporation of tin films and next plasma oxidation of the metal films. The influence of technological parameters (e.g. plasma parameters, oxidation time and voltage bias applied to the substrate during oxidation) on the surface properties of the oxide films was studied by Atomic Force Microscopy (AFM).
Czech name
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Czech description
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Project
<a href="/en/project/OC%20527.50" target="_blank" >OC 527.50: Polymer Thin Films Study by AFM and Improvement of Plasma Diagnostics Methods</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2001
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Symposium proceedings 15th International Symposium on Plasma Chemistry, ISPC - 15
ISBN
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ISSN
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e-ISSN
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Number of pages
6
Pages from-to
3279-3284
Publisher name
GREMI, CNRS/University of Orléans
Place of publication
Orléans
Event location
Orléans
Event date
Jul 13, 2001
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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