Properties of the Thin SnO2 Layers Produces by Plasma Oxidation

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F44555601%3A13430%2F01%3A00001469" target="_blank" >RIV/44555601:13430/01:00001469 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Properties of the Thin SnO2 Layers Produces by Plasma Oxidation
Original language description
The development of gas sensors in the last few years has shown an important interest in thin tin oxide films. The SnO2 is one of the most widely used materials for gas sensor applications due to their properties and their good perfomance for the detection of oxidable gases. When SnO2 layers are used in gas sensors, some features can depend on many layer parameters. In this work we have studied the properties of SnO2 thin films produced by thermal evaporation deposition of tin metal films and plasma oxidation of these metal films. The effect of technological parameters (e.g. plasma parameters of the oxide films was studied by Atomic Force Microscopy (AFM) and Rutherford Back Scattering (RBS).
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Project
<a href="/en/project/OK%20401" target="_blank" >OK 401: Development of Plasma-based Products and Processes</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2001
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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