AFM Investigations of SnO2 Thin Films Prepared by Plasma Oxidation

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F44555601%3A13430%2F01%3A00001470" target="_blank" >RIV/44555601:13430/01:00001470 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
AFM Investigations of SnO2 Thin Films Prepared by Plasma Oxidation
Original language description
In this work, we have studied surface properties of SnO2 thin films produced by thermal evaporation of Sn films followed by in situ plasma oxidation. The dependence of surface properties on technological parameters was studied by Atomic Force Microscopy(AFM). The experimental results describe the dependence of surface topology on substrate properties, on evaporating conditions and on parameters of plasma oxidation (e.g. plasma parameters, oxidation time and voltage bias applied to the substrate duringoxidation).
Czech name
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Czech description
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Project
<a href="/en/project/OK%20401" target="_blank" >OK 401: Development of Plasma-based Products and Processes</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2001
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Proc. 7th European Vacuum Conference and 3rd European Topical Conference on Hard Coiatings - EVC - 7 and ETCH - 3
ISBN
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ISSN
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e-ISSN
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Number of pages
1
Pages from-to
101
Publisher name
Aseva
Place of publication
Madrid
Event location
Madrid
Event date
Sep 17, 2001
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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