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Deposition and characterization of single magnetron deposited Fe:SnOx coatings

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F44555601%3A13440%2F15%3A43887147" target="_blank" >RIV/44555601:13440/15:43887147 - isvavai.cz</a>

  • Result on the web

    <a href="http://dx.doi.org/10.1016/j.tsf.2015.11.009" target="_blank" >http://dx.doi.org/10.1016/j.tsf.2015.11.009</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1016/j.tsf.2015.11.009" target="_blank" >10.1016/j.tsf.2015.11.009</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Deposition and characterization of single magnetron deposited Fe:SnOx coatings

  • Original language description

    Coatings deposited by magnetron co-sputtering from a single RF magnetron with a ceramic SnO2 target with iron inset in argon plasma were studied. The mass spectra of the process identified Sn+ and SnO+ species as the dominant species sputtered from the target, but no SnO2+ species were detected. The dominant positive ions in argon plasma are Ar+ species. The only detected negative ions were OMINUS SIGN . Sputtered neutral tin related species were not detected. Iron related species were also not detectedbecause their concentration is below the detection limit. The concentration of iron dopant in the tin oxide coatings was controlled by the RF bias applied on the substrate holder while the discharge pressure also has some influence. The iron concentration was in the range from 0.9 at.% up to 19 at.% increasing with the substrate bias while the sheet resistivity decreases. The stoichiometry ratio of O/(Sn + Fe) in the coatings increased from 1.7 up to 2 in dependence on the substrate bia

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    JK - Corrosion and material surfaces

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/GA13-06989S" target="_blank" >GA13-06989S: Plasma-chemical modification of phyllosilicates for functional nanostructures</a><br>

  • Continuities

    S - Specificky vyzkum na vysokych skolach

Others

  • Publication year

    2015

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Thin Solid Films

  • ISSN

    0040-6090

  • e-ISSN

  • Volume of the periodical

    595

  • Issue of the periodical within the volume

    NOV 30 2015

  • Country of publishing house

    NL - THE KINGDOM OF THE NETHERLANDS

  • Number of pages

    8

  • Pages from-to

    200-208

  • UT code for WoS article

    000365812400034

  • EID of the result in the Scopus database