Structure and mechanical properties of magnetron sputtered Zr-Si-N films with a high Si content

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F03%3A00000133" target="_blank" >RIV/49777513:23520/03:00000133 - isvavai.cz</a>

Result on the web

—

DOI - Digital Object Identifier

—

Result language

angličtina

Original language name

Structure and mechanical properties of magnetron sputtered Zr-Si-N films with a high Si content

Original language description

The Zr-Si-N films were deposited using unbalanced dc reactive magnetron sputtering of an alloyed ZrSi2 target, in a mixture of argon and nitrogen, onto steel and silicon substrates. Thisarticle reports on the investigation of film structure, chemical composition and mechanical properties of Zr-Si-N films with a high Si content as a function of partial pressure of nitrogen pN2, discharge current ID and substrate temperature TS. Residual stress of the films was evaluated by measuring a change of the curvature induced in the silicon substrate.

Czech name

—

Czech description

—

Type

D - Article in proceedings

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

—

Project

<a href="/en/project/ME%20529" target="_blank" >ME 529: Nanostructured thin films</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2003

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection

JUNIORMAT '03

ISBN

80-214-2462-1

ISSN

—

e-ISSN

—

Number of pages

4

Pages from-to

34-37

Publisher name

University of Technology

Place of publication

Brno

Event location

Brno

Event date

Sep 23, 2003

Type of event by nationality

EUR - Evropská akce

UT code for WoS article

—