High-temperature stability of the mechanical and optical properties of Si-B-C-N films prepared by magnetron sputtering

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F09%3A00501690" target="_blank" >RIV/49777513:23520/09:00501690 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

High-temperature stability of the mechanical and optical properties of Si-B-C-N films prepared by magnetron sputtering

Original language description

Amorphous Si-B-C-N films with two compositions (Si34B9C4N49 and Si36B13C7N40) and low contamination level (H+O+Ar < 4 at.%) were deposited on silicon substrates by reactive dc magnetron co-sputtering using two different targets and gas mixtures. Thermalstability of these films was investigated in terms of composition, bonding structure, as well as mechanical and optical properties after annealing in helium up to the 1300°C substrate limit. Furthermore, both Si-B-C-N materials studied here exhibited extremely high oxidation resistance in air up to the 1300°C substrate limit.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

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Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2009

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Thin Solid Films

ISSN

0040-6090

e-ISSN

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Volume of the periodical

518

Issue of the periodical within the volume

1

Country of publishing house

NL - THE KINGDOM OF THE NETHERLANDS

Number of pages

6

Pages from-to

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UT code for WoS article

000270628800030

EID of the result in the Scopus database

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