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Thermal stability of magnetron sputtered Si-B-C-N materials at temperatures up to 1700 °C

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F10%3A00503542" target="_blank" >RIV/49777513:23520/10:00503542 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Thermal stability of magnetron sputtered Si-B-C-N materials at temperatures up to 1700 °C

  • Original language description

    Thermal stability of deposited Si-B-C-N materials (film fragments or powders without a substrate) in inert gases (He and Ar) up to 1700 °C was investigated using differential scanning calorimetry, high-resolution thermogravimetry and X-ray diffraction measurements. Amorphous Si-B-C-N films were fabricated by dc magnetron co-sputtering of a single B4C-Si target in two nitrogen-argon gas mixtures (50% N2 + 50% Ar or 25% N2 + 75% Ar). It was found that the deposited Si-B-C-N materials can be more stable athigh temperatures in the inert atmosphere than the usually used substrates (e.g. SiC or BN). The materials with the compositions (in at.%) Si32-33B10C2N50-51, for which N/(Si+B+C)=1.1-1.2, retained their amorphous structure up to 1600 °C without any structural transformations and detectable mass changes.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

  • Continuities

    Z - Vyzkumny zamer (s odkazem do CEZ)

Others

  • Publication year

    2010

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Thin Solid Films

  • ISSN

    0040-6090

  • e-ISSN

  • Volume of the periodical

    519

  • Issue of the periodical within the volume

    1

  • Country of publishing house

    NL - THE KINGDOM OF THE NETHERLANDS

  • Number of pages

    6

  • Pages from-to

  • UT code for WoS article

    000283955200054

  • EID of the result in the Scopus database