Magnetron sputtered Si-B-C-N films with high oxidation resistance and thermal stability in air at temperatures above 1500 degrees C

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389005%3A_____%2F08%3A00313775" target="_blank" >RIV/61389005:_____/08:00313775 - isvavai.cz</a>

Alternative codes found

RIV/49777513:23520/08:00500614

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Magnetron sputtered Si-B-C-N films with high oxidation resistance and thermal stability in air at temperatures above 1500 degrees C

Original language description

Novel quaternary Si-B-C-N materials are becoming increasingly attractive because of their possible high-temperature and harsh-environment applications. In the present work, amorphous Si-B-C-N films were deposited on Si and SiC substrates by reactive dc magnetron cosputtering using a single C-Si -B or B4C-Si target in nitrogen-argon gas mixtures. A fixed 75% Si fraction in the target erosion areas, a rf induced negative substrate bias voltage of -100 V, a substrate temperature of 350 degrees C, and a total pressure of 0.5 Pa were used in the depositions. The corresponding discharge and deposition characteristics (such as the ion-to-film-forming particle flux ratio, ion energy per deposited atom, and deposition rate) are presented to understand complex relationships between process parameters and film characteristics. Films deposited under optimized conditions (B4C-Si target, 50% N-2+50% Ar gas mixture), possessing a composition (in at. %).

Czech name

Magnetronem nastříkané vrstvy Si-B-C-N s vysokou oxidační odolností a tepelnou stabilitou na vzduchu při teplotách nad 1500 stupňů C

Czech description

Nové čtyřsložkové materiály Si-B-C-N se stávají atraktivními pro jejich možné aplikace ve vysokoteplotním a nepříznivém prostředí. V této práci byly amorfní vrstvy Si-B-C-N deponovány na substrátech Si a SiC.

Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BG - Nuclear, atomic and molecular physics, accelerators

OECD FORD branch

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Project

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Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2008

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films

ISSN

0734-2101

e-ISSN

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Volume of the periodical

26

Issue of the periodical within the volume

5

Country of publishing house

US - UNITED STATES

Number of pages

8

Pages from-to

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UT code for WoS article

000259296000001

EID of the result in the Scopus database

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