Pulsed Magnetron Sputtering of Metallic Films Using a Hot Target

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F09%3A00502104" target="_blank" >RIV/49777513:23520/09:00502104 - isvavai.cz</a>
Alternative codes found
RIV/49777513:23640/09:00502104
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Pulsed Magnetron Sputtering of Metallic Films Using a Hot Target
Original language description
Pulsed magnetron sputtering of titanium films was performed using a directly water-cooled target and a hot target of 100 mm diameter to investigate the effect of the target temperature on the sputtering process. The repetition frequency of the pulsed dcpower supply was 10 kHz at a 20% duty cycle and an argon pressure of 0.5 Pa. Almost constant target temperatures during depositions with the hot target, being heated by ion bombardment itself, were controlled by preset values of the average pulse currentat a target power density in a pulse up to 340 W per square centimeter. It has been shown that an increase in the surface temperature of the hot target resulted in a rise in the deposition rate (up to 1.9 times) at a decreasing average pulse voltage (upto 1.5 times) compared to the cooled target with the same average pulse target current density (up to 0.33 A per square centimeter).
Czech name
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Czech description
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Publication year
2009
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Society of Vacuum Coaters: Technical Conference Proceedings
ISBN
978-1-878068-29-3
ISSN
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e-ISSN
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Number of pages
5
Pages from-to
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Publisher name
Society of Vacuum Coaters
Place of publication
Santa Clara
Event location
Santa Clara
Event date
May 14, 2009
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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