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Thermal conductivity of high-temperature Si-B-C-N thin films

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F11%3A43896514" target="_blank" >RIV/49777513:23520/11:43896514 - isvavai.cz</a>

  • Result on the web

    <a href="http://dx.doi.org/10.1016/j.surfcoat.2011.07.058" target="_blank" >http://dx.doi.org/10.1016/j.surfcoat.2011.07.058</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1016/j.surfcoat.2011.07.058" target="_blank" >10.1016/j.surfcoat.2011.07.058</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Thermal conductivity of high-temperature Si-B-C-N thin films

  • Original language description

    In this study, thermal transport was investigated for ceramic films with different silicon, boron, carbon, and nitrogen (Si-B-C-N) compositions. In order to investigate the effect of morphology on thermal barrier properties, the microstructure of these materials was varied from amorphous to nanocrystalline. Thermal conductivity trends of several ceramic thin films were characterized with a TDTR technique. Samples containing two different Si-B-C-N chemical compositions were created by reactive magnetronsputtering and then subjected to annealing at temperatures up to 1400 °C. The room temperature thermal conductivity of the samples prepared via a 50% argon/50% nitrogen gas mixture remained constant, while samples prepared via a 75% argon/25% nitrogen gas mixture exhibited an increase in the thermal conductivity. The experiments reveal which Si-B-C-N film composition remains stable in the amorphous state at high temperatures, thereby retaining lower thermal transport properties.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/OC10045" target="_blank" >OC10045: Novel plasma sources for film deposition and surface modification</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Others

  • Publication year

    2011

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Surface & Coatings Technology

  • ISSN

    0257-8972

  • e-ISSN

  • Volume of the periodical

    206

  • Issue of the periodical within the volume

    7

  • Country of publishing house

    US - UNITED STATES

  • Number of pages

    4

  • Pages from-to

    2030-2033

  • UT code for WoS article

  • EID of the result in the Scopus database