Elimination of Arcing in Reactive Sputtering of Al2O3 Thin Films Prepared by DC Pulse Single Magnetron

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F11%3A43898487" target="_blank" >RIV/49777513:23520/11:43898487 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1002/ppap.201000208" target="_blank" >http://dx.doi.org/10.1002/ppap.201000208</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1002/ppap.201000208" target="_blank" >10.1002/ppap.201000208</a>

Result language
angličtina
Original language name
Elimination of Arcing in Reactive Sputtering of Al2O3 Thin Films Prepared by DC Pulse Single Magnetron
Original language description
The article reports on the elimination of arcing in the DC pulse reactive sputtering of Al2O3 thin films using a single unbalanced magnetron operating at relatively high target power density. Correlations between pulse length, pulse-off time, repetitionfrequency and arcing at the target surface were investigated in detail. It is shown that the length of pulse-off time is of key importance for elimination of arcing in pulse reactive sputtering of electrically insulating compounds using a single magnetron.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Project
<a href="/en/project/OC10045" target="_blank" >OC10045: Novel plasma sources for film deposition and surface modification</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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