Deposition rate enhancement in HiPIMS without compromising the ionized fraction of the deposition flux
Result description
We systematically investigate and quantify different physical phenomena influencing the deposition rate, aD, of Nb coatings prepared by high power impulse magnetron sputtering (HiPIMS), and propose a straightforward approach for deposition rate enhancement through the control of the magnetron's magnetic field. The magnetic field strength at the target surface, B, of a 50 mm diameter magnetron was controlled by the application of paramagnetic spacers with different thicknesses in between the magnetron surface and the target. We found that lowering B achieved by the application of a 2.8 mm thick spacer led to an increase in aD by a factor of ~4.5 (from 10.6 to 45.2 nm/min) when the discharge was operated at a fixed average pulse target power density (2.5kW/cm2). However, the ionized fraction of the deposition flux onto the substrate was found to be comparable, despite a large difference in B-dependent discharge characteristics (magnetron voltage and discharge current). We show that the
Keywords
Nb coatingsplasmamagnetic fielddeposition rate enhancementHiPIMS
The result's identifiers
Result code in IS VaVaI
Result on the web
DOI - Digital Object Identifier
Alternative languages
Result language
angličtina
Original language name
Deposition rate enhancement in HiPIMS without compromising the ionized fraction of the deposition flux
Original language description
We systematically investigate and quantify different physical phenomena influencing the deposition rate, aD, of Nb coatings prepared by high power impulse magnetron sputtering (HiPIMS), and propose a straightforward approach for deposition rate enhancement through the control of the magnetron's magnetic field. The magnetic field strength at the target surface, B, of a 50 mm diameter magnetron was controlled by the application of paramagnetic spacers with different thicknesses in between the magnetron surface and the target. We found that lowering B achieved by the application of a 2.8 mm thick spacer led to an increase in aD by a factor of ~4.5 (from 10.6 to 45.2 nm/min) when the discharge was operated at a fixed average pulse target power density (2.5kW/cm2). However, the ionized fraction of the deposition flux onto the substrate was found to be comparable, despite a large difference in B-dependent discharge characteristics (magnetron voltage and discharge current). We show that the
Czech name
—
Czech description
—
Classification
Type
Jx - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
—
Result continuities
Project
—
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2013
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Physics D: Applied Physics
ISSN
0022-3727
e-ISSN
—
Volume of the periodical
2013
Issue of the periodical within the volume
46
Country of publishing house
GB - UNITED KINGDOM
Number of pages
10
Pages from-to
2052051-20520510
UT code for WoS article
000318546100011
EID of the result in the Scopus database
—
Result type
Jx - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP
BL - Plasma physics and discharge through gases
Year of implementation
2013