The effect of magnetic field strength and geometry on the deposition rate and ionized flux fraction in the HiPIMS discharge

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F19%3A00519372" target="_blank" >RIV/68378271:_____/19:00519372 - isvavai.cz</a>

Result on the web

<a href="http://hdl.handle.net/11104/0304364" target="_blank" >http://hdl.handle.net/11104/0304364</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.3390/plasma2020015" target="_blank" >10.3390/plasma2020015</a>

Result language

angličtina

Original language name

The effect of magnetic field strength and geometry on the deposition rate and ionized flux fraction in the HiPIMS discharge

Original language description

We explored the effect of magnetic field strength B and geometry (degree of balancing) on the deposition rate and ionized flux fraction Fflux in dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS) when depositing titanium. The HiPIMS discharge was run in two different operating modes. The first one we refer to as “fixed voltage mode” where the cathode voltage was kept fixed at 625 V while the pulse repetition frequency was varied to achieve the desired time average power (300 W). The second mode we refer to as “fixed peak current mode” and was carried out by adjusting the cathode voltage to maintain a fixed peak discharge current and by varying the frequency to achieve the same average power. Our results show that the dcMS deposition rate was weakly sensitive to variations in the magnetic field while the deposition rate during HiPIMS operated in fixed voltage mode changed from 30% to 90% of the dcMS deposition rate as B decreased.

Czech name

—

Czech description

—

Type

J_ost - Miscellaneous article in a specialist periodical

CEP classification

—

OECD FORD branch

10305 - Fluids and plasma physics (including surface physics)

Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2019

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Plasma

ISSN

2571-6182

e-ISSN

—

Volume of the periodical

2

Issue of the periodical within the volume

2

Country of publishing house

CH - SWITZERLAND

Number of pages

21

Pages from-to

201-221

UT code for WoS article

—

EID of the result in the Scopus database

—