A parametric model for reactive high-power impulse magnetron sputtering of films

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F16%3A43927050" target="_blank" >RIV/49777513:23520/16:43927050 - isvavai.cz</a>
Result on the web
<a href="http://iopscience.iop.org/article/10.1088/0022-3727/49/5/055202" target="_blank" >http://iopscience.iop.org/article/10.1088/0022-3727/49/5/055202</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1088/0022-3727/49/5/055202" target="_blank" >10.1088/0022-3727/49/5/055202</a>

Result language
angličtina
Original language name
A parametric model for reactive high-power impulse magnetron sputtering of films
Original language description
We present a time-dependent parametric model for reactive HiPIMS deposition of films. Specific features of HiPIMS discharges and a possible increase in the density of the reactive gas in front of the reactive gas inlets placed between the target and the substrate are considered in the model. The model makes it possible to calculate the compound fractions in two target layers and in one substrate layer, and the deposition rate of films at fixed partial pressures of the reactive and inert gas. A simplified relation for the deposition rate of films prepared using a reactive HiPIMS is presented. We used the model to simulate controlled reactive HiPIMS depositions of stoichiometric ZrO2 films, which were recently carried out in our laboratories with two different configurations of the O2 inlets in front of the sputtered target. Our model calculations show that the to-substrate O2 inlet provides systematically lower compound fractions in the target surface layer and higher compound fractions in the substrate surface layer, compared with the to-target O2 inlet. The low compound fractions in the target surface layer result in high deposition rates of the films produced, which are in agreement with experimental values.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Project
<a href="/en/project/GA14-03875S" target="_blank" >GA14-03875S: Nanostructured multifunctional coatings prepared using highly ionized pulsed plasmas</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2016
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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