Dynamics of processes during the deposition of ZrO2 films by controlled reactive high-power impulse magnetron sputtering: A modelling study

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F17%3A43932161" target="_blank" >RIV/49777513:23520/17:43932161 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1063/1.4996186" target="_blank" >http://dx.doi.org/10.1063/1.4996186</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1063/1.4996186" target="_blank" >10.1063/1.4996186</a>

Result language
angličtina
Original language name
Dynamics of processes during the deposition of ZrO2 films by controlled reactive high-power impulse magnetron sputtering: A modelling study
Original language description
A time-dependent parametric model was applied to controlled reactive high-power impulse magnetron sputtering (HiPIMS) depositions of stoichiometric ZrO2 films, carried out in our laboratories, (i) to clarify the complicated dynamics of the processes on the target and substrate surfaces during voltage pulses, and (ii) to corroborate the importance of the O2 inlet configuration (position and direction) which strongly affects the O2 dissociation in the discharge and the chemisorption flux of oxygen atoms and molecules onto the substrate. For the experimental conditions with the to-substrate O2 inlets, the deposition-averaged target power density of 50 W/cm^2, and the oxygen partial pressure of 0.05 Pa (being close to the mean value during controlled depositions), our model predicts a low compound fraction, changing between 8% and 12%, in the target surface layer at an almost constant high compound fraction, changing between 92% and 93%, in the substrate surface layer during the pulse period (2000 μs). The calculated deposition rate of 89 nm/min for these films is in good agreement with the measured value of 80 nm/min achieved for optically transparent stoichiometric ZrO2 films prepared under these conditions.
Czech name
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Czech description
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Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)

Project
<a href="/en/project/GJ15-00859Y" target="_blank" >GJ15-00859Y: Design of new functional materials, and pathways for their atom-by-atom preparation, using advanced computer modelling</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2017
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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