Microstructure of hard and optically transparent HfO2 films prepared by high-power impulse magnetron sputtering with a pulsed oxygen flow control

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F16%3A43930204" target="_blank" >RIV/49777513:23520/16:43930204 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1016/j.tsf.2016.10.059" target="_blank" >http://dx.doi.org/10.1016/j.tsf.2016.10.059</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.tsf.2016.10.059" target="_blank" >10.1016/j.tsf.2016.10.059</a>

Result language
angličtina
Original language name
Microstructure of hard and optically transparent HfO2 films prepared by high-power impulse magnetron sputtering with a pulsed oxygen flow control
Original language description
Reactive high-power impulse magnetron sputtering was used to deposit HfO2 films on Si substrates using a voltage pulse duration, t1, from 100 to 200 ?s and an deposition-averaged target power density from 7.2 to 54 W/cm^2. The effects of these processing parameters on the microstructure and properties of the films were studied by atomic force microscopy, nano-indentation, X-ray diffraction, electron diffraction and high-resolution transmission electron microscopy. All films were found to be composed of an interlayer next to the Si interface followed by a nano-columnar structure layer. A reduction in <Sd> caused an increase in the interlayer thickness and a decrease in the width of the nano-columnar structures from ~46 nm to ~21 nm. Films prepared with larger t1 = 200 ?s have a monoclinic HfO2 structure and that with smaller t1 = 100 ?s exhibits a mixture of monoclinic and orthorhombic HfO2. A high hardness of 17.0-17.6 GPa was shown for films with a monoclinic HfO2 structure. The films exhibited a refractive index of 2.02-2.11 and an extinction coefficient between 0.0001 and 0.001 (both at a wavelength of 550 nm).
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
JJ - Other materials
OECD FORD branch
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Project
<a href="/en/project/GA14-03875S" target="_blank" >GA14-03875S: Nanostructured multifunctional coatings prepared using highly ionized pulsed plasmas</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2016
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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