CONTROLLED REACTIVE HiPIMS – EFFECTIVE TECHNIQUE FOR LOW-TEMPERATURE DEPOSITION OF FUNCTIONAL OXIDE FILMS

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F18%3A43951298" target="_blank" >RIV/49777513:23520/18:43951298 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
CONTROLLED REACTIVE HiPIMS – EFFECTIVE TECHNIQUE FOR LOW-TEMPERATURE DEPOSITION OF FUNCTIONAL OXIDE FILMS
Original language description
Reactive high-power impulse magnetron sputtering with a feedback pulsed O2 flow control and to-substrate O2 injection into a high-density plasma in front of the sputtered metal (V or Hf) target was used for low-temperature (300 °C) deposition of thermochromic VO2 films onto conventional soda-lime glass substrates without any substrate bias voltage and without any interlayer, and for high-rate deposition (up to 200 nm/min) of densified (n550 = 2.12, H = 18 GPa), optically transparent (k550 = 0.0005), stoichiometric HfO2 films onto floating substrates at the substrate temperatures less than 140 °C. We give the basic principles of this effective deposition technique with a high application potential.
Czech name
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Czech description
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Project
<a href="/en/project/EF17_048%2F0007267" target="_blank" >EF17_048/0007267: Research and Development of Intelligent Components of Advanced Technologies for the Pilsen Metropolitan Area (InteCom)</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2018
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
9th International Conference on Power Electronics for Plasma Engineering Conference Proceedings
ISBN
978-83-930983-8-5
ISSN
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e-ISSN
neuvedeno
Number of pages
7
Pages from-to
"28.1"-"28.7"
Publisher name
TRUMPF Huettinger Sp. z o.o.
Place of publication
Zielonka
Event location
Freiburg, Germany
Event date
May 14, 2018
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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