Ion-flux characteristics during low-temperature (300 °C) deposition of thermochromic VO2 films using controlled reactive HiPIMS
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F19%3A43953478" target="_blank" >RIV/49777513:23520/19:43953478 - isvavai.cz</a>
Result on the web
<a href="http://doi.org/10.1088/1361-6463/aae9c6" target="_blank" >http://doi.org/10.1088/1361-6463/aae9c6</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1088/1361-6463/aae9c6" target="_blank" >10.1088/1361-6463/aae9c6</a>
Alternative languages
Result language
angličtina
Original language name
Ion-flux characteristics during low-temperature (300 °C) deposition of thermochromic VO2 films using controlled reactive HiPIMS
Original language description
The ion-flux characteristics at a substrate position and the corresponding discharge characteristics were investigated during controlled low-temperature (300 °C) reactive HiPIMS depositions of thermochromic VO2 films onto conventional soda-lime glass substrates without any substrate bias voltage and without any interlayer. It was shown that the phase composition of the films correlates with the (V+ + V2+) ion fraction and the (V+ + V2+):(2O2+ + O+) ion ratio in the total ion flux onto the substrate. Setting the amount of oxygen in the gas mixture allowed us to control not only the phase composition of the films but also their crystallinity. It was found that an appropriate composition of the total ion flux and high ion energies (up to 50 eV relative to ground potential) support the crystallization of the thermochromic phase in the VO2 films. We achieved a high modulation of the transmittance at 2500 nm (between 51% and 8%) and of the electrical resistivity (changed 350 times) for a 88 nm thick VO2 film.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
20506 - Coating and films
Result continuities
Project
<a href="/en/project/GA17-08944S" target="_blank" >GA17-08944S: Nanostructured coatings synthesized using highly reactive pulsed plasmas</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2019
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
JOURNAL OF PHYSICS D-APPLIED PHYSICS
ISSN
0022-3727
e-ISSN
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Volume of the periodical
52
Issue of the periodical within the volume
2
Country of publishing house
GB - UNITED KINGDOM
Number of pages
9
Pages from-to
„025205-1“-„025205-9“
UT code for WoS article
000449372400002
EID of the result in the Scopus database
2-s2.0-85056719206