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Ion-flux characteristics during low-temperature (300 °C) deposition of thermochromic VO2 films using controlled reactive HiPIMS

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F19%3A43953478" target="_blank" >RIV/49777513:23520/19:43953478 - isvavai.cz</a>

  • Result on the web

    <a href="http://doi.org/10.1088/1361-6463/aae9c6" target="_blank" >http://doi.org/10.1088/1361-6463/aae9c6</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1088/1361-6463/aae9c6" target="_blank" >10.1088/1361-6463/aae9c6</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Ion-flux characteristics during low-temperature (300 °C) deposition of thermochromic VO2 films using controlled reactive HiPIMS

  • Original language description

    The ion-flux characteristics at a substrate position and the corresponding discharge characteristics were investigated during controlled low-temperature (300 °C) reactive HiPIMS depositions of thermochromic VO2 films onto conventional soda-lime glass substrates without any substrate bias voltage and without any interlayer. It was shown that the phase composition of the films correlates with the (V+ + V2+) ion fraction and the (V+ + V2+):(2O2+ + O+) ion ratio in the total ion flux onto the substrate. Setting the amount of oxygen in the gas mixture allowed us to control not only the phase composition of the films but also their crystallinity. It was found that an appropriate composition of the total ion flux and high ion energies (up to 50 eV relative to ground potential) support the crystallization of the thermochromic phase in the VO2 films. We achieved a high modulation of the transmittance at 2500 nm (between 51% and 8%) and of the electrical resistivity (changed 350 times) for a 88 nm thick VO2 film.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    20506 - Coating and films

Result continuities

  • Project

    <a href="/en/project/GA17-08944S" target="_blank" >GA17-08944S: Nanostructured coatings synthesized using highly reactive pulsed plasmas</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2019

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    JOURNAL OF PHYSICS D-APPLIED PHYSICS

  • ISSN

    0022-3727

  • e-ISSN

  • Volume of the periodical

    52

  • Issue of the periodical within the volume

    2

  • Country of publishing house

    GB - UNITED KINGDOM

  • Number of pages

    9

  • Pages from-to

    „025205-1“-„025205-9“

  • UT code for WoS article

    000449372400002

  • EID of the result in the Scopus database

    2-s2.0-85056719206