Dependence of the ZrO2 growth on the crystal orientation: growth simulations and magnetron sputtering

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F22%3A43963401" target="_blank" >RIV/49777513:23520/22:43963401 - isvavai.cz</a>
Result on the web
<a href="https://doi.org/10.1016/j.apsusc.2021.151422" target="_blank" >https://doi.org/10.1016/j.apsusc.2021.151422</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.apsusc.2021.151422" target="_blank" >10.1016/j.apsusc.2021.151422</a>

Result language
angličtina
Original language name
Dependence of the ZrO2 growth on the crystal orientation: growth simulations and magnetron sputtering
Original language description
The growth of crystalline ZrO2 is studied by a combined approach of atom-by-atom growth simulations, high-power impulse magnetron sputtering and conventional pulsed magnetron sputtering. We focus on the energy of arriving atoms of various elements and investigate how does it affect the growth of ZrO2 crystals of various orientations. The results are correlated with quantities such as surface energy and horizontal periodicity of individual orientations. Simulations show that the growth of orientations characterized by high surface energy and short horizontal period, (001) in the first place, requires higher energy delivered by arriving atoms, and that the energy is more effectively delivered by heavy Zr than by light O. Experiments confirm that the relative preference of such orientations increases with increasing substrate bias voltage, increasing concentration of ions which are subsequently accelerated by the bias voltage, and synchronization of the pulsed bias voltage with the arrival of heavy Zr+ ions.
Czech name
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Czech description
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Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
20506 - Coating and films

Project
<a href="/en/project/GA19-14011S" target="_blank" >GA19-14011S: Design of novel functional materials, and pathways for their reactive magnetron sputtering, using advanced computer simulations</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2022
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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