On the surface biasing effectiveness during reactive high-power impulse magnetron sputter deposition of zirconium dioxide

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F23%3A43968941" target="_blank" >RIV/49777513:23520/23:43968941 - isvavai.cz</a>

Result on the web

<a href="https://doi.org/10.1016/j.apsusc.2023.158131" target="_blank" >https://doi.org/10.1016/j.apsusc.2023.158131</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.apsusc.2023.158131" target="_blank" >10.1016/j.apsusc.2023.158131</a>

Result language

angličtina

Original language name

On the surface biasing effectiveness during reactive high-power impulse magnetron sputter deposition of zirconium dioxide

Original language description

In this study, we investigate the effect of surface biasing during high-power impulse magnetron sputter deposition of non-conductive zirconium dioxide films on substrates with different capacitances. We employ reactive high-power impulse magnetron sputtering to deposit ZrO2 films using a circular Zr target in a pure oxygen atmosphere. The deposition experiments are conducted on two types of substrates: high-capacitance (thin thermally grown SiO2 on Si) and low-capacitance (soda-lime glass). By varying the time shift between the target voltage pulse and the negative substrate bias voltage pulse, we analyze the impact on the preferred crystal orientation of the deposited ZrO2 films and the deposition rate. We measure the current and voltage waveforms, during the deposition process and utilize a surface charging model to understand the charging behavior of the growing film. Additionally, time- and energy-resolved ion mass spectra are measured to gain insights into the ion behavior during film growth. Our results demonstrate that energetic ion bombardment and appropriate timing of substrate biasing can influence the crystal orientation of ZrO2 films, favouring specific orientations over others. We also explain the different behavior observed on low- and high-capacitance substrates.

Czech name

—

Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

—

OECD FORD branch

20506 - Coating and films

Project

<a href="/en/project/GA21-28277S" target="_blank" >GA21-28277S: High-performance thermochromic VO2-based coatings with a low transition temperature prepared using reactive pulsed plasmas</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2023

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

APPLIED SURFACE SCIENCE

ISSN

0169-4332

e-ISSN

1873-5584

Volume of the periodical

638

Issue of the periodical within the volume

30 NOV 2023

Country of publishing house

NL - THE KINGDOM OF THE NETHERLANDS

Number of pages

10

Pages from-to

1-10

UT code for WoS article

001140304500001

EID of the result in the Scopus database

2-s2.0-85166476666