Particle-based simulation of atom and ion transport in HiPIMS: effect of the plasma potential distribution on the ionized flux fraction

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F23%3A43968385" target="_blank" >RIV/49777513:23520/23:43968385 - isvavai.cz</a>

Result on the web

<a href="https://doi.org/10.1088/1361-6595/acc549" target="_blank" >https://doi.org/10.1088/1361-6595/acc549</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/1361-6595/acc549" target="_blank" >10.1088/1361-6595/acc549</a>

Result language

angličtina

Original language name

Particle-based simulation of atom and ion transport in HiPIMS: effect of the plasma potential distribution on the ionized flux fraction

Original language description

We present a three-dimensional particle-based computer simulation of high-power impulse magnetron sputtering (HiPIMS) discharges which enables us to simulate the transport of atoms and ions in the discharge and the corresponding plasma parameters. A numerical algorithm is used to constrain the simulation by an experimental target current waveform, which ensures that the simulation results are closely tied to the experimental discharge conditions. Simulations of a HiPIMS discharge with Ti target show the capability to calculate the spatial distributions of target material atoms and ions and also to quantify the process-gas rarefaction. We evaluated, among others, the ion return probability and the ionized fraction of the target material flux onto the substrate for various values of the potential difference across the magnetic presheath in front of the target racetrack, which is responsible for attracting most of the plasma ions towards the target.

Czech name

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Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

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OECD FORD branch

10305 - Fluids and plasma physics (including surface physics)

Project

—

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2023

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

PLASMA SOURCES SCIENCE &amp; TECHNOLOGY

ISSN

0963-0252

e-ISSN

1361-6595

Volume of the periodical

32

Issue of the periodical within the volume

3

Country of publishing house

GB - UNITED KINGDOM

Number of pages

16

Pages from-to

"035007-1"-"035007-16"

UT code for WoS article

000962002200001

EID of the result in the Scopus database

2-s2.0-85151619056