On the control of the composition of NbC films deposited by HiPIMS from a compound target: plasma diagnostics

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F23%3A43968831" target="_blank" >RIV/49777513:23520/23:43968831 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
On the control of the composition of NbC films deposited by HiPIMS from a compound target: plasma diagnostics
Original language description
This presentation focuses on explaining the observed change in the composition of films prepared by HiPIMS. The composition changed from C-rich films to stoichiometric NbC films with increasing pulse-averaged power density (realized by shortening the pulse length). To untangle the influence of the plasma processes on the C/Nb ratio in the films, Nb+ and C+ fluxes at the substrate position were measured by energy-resolved mass spectroscopy, and trends in the ratios of Nb and C neutral and ion species at various positions in the discharge were monitored by optical emission spectroscopy. These experimental results are supported by a theoretical analysis of the target composition and of the transport of plasma species in the discharge, employing a pathway discharge model and particle-based simulations. The aim of this presentation is to provide a general understanding applicable to magnetron sputtering of various multi-component targets.
Czech name
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Czech description
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Publication year
2023
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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