Studying the transport of atoms sputtered from a compound NbC target in HiPIMS discharges: plasma diagnostics and modelling

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F23%3A43969322" target="_blank" >RIV/49777513:23520/23:43969322 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Studying the transport of atoms sputtered from a compound NbC target in HiPIMS discharges: plasma diagnostics and modelling
Original language description
This presentation focuses on explaining the observed change in the composition of NbC films (prepared by HiPIMS) with the increase in the pulse-averaged power density (realized by shortening the pulse length). To untangle the influence of the plasma processes on the transport of atoms in the discharge and, eventually, on the C/Nb ratio in the films, we use several plasma diagnostics techniques and modelling approaches. We measure Nb+ and C+ fluxes at the substrate position by energy-resolved mass spectroscopy and evaluate the ratios of Nb and C neutral and ion species at various positions in the discharge by optical emission spectroscopy. Using a pathway discharge model and particle-based Monte Carlo simulations, we analyze the ionization and return probabilities of Nb+ and C+ ions and their effect on the sputtering process and, consequently, the film composition.
Czech name
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Czech description
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Publication year
2023
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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