<<A>> perspective of magnetron sputtering in surface engineering

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F99%3A00039226" target="_blank" >RIV/49777513:23520/99:00039226 - isvavai.cz</a>
Alternative codes found
RIV/68378271:_____/99:02000093
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
<<A>> perspective of magnetron sputtering in surface engineering
Original language description
Magnetron sputtering is a very powerful process which is now currently and successfully used in many applications, particularly in microelectronic and surface engineering, for the production of films and coatings. Magnetron technology is, however, continuously developing because new advanced films with prescribed physical and functional properties are needed. This paper reports on duplex coatings, nanocomposite coatings, high-rate magnetron sputtering and self-sputtering, i.e. new advances in magnetronsputtering technology which are of great importance for future development of surface engineering. A great deal of attention is devoted to (i) the coating/substrate interface, (ii) the magnetron sputtering of nanostructured coatings with new properties due to small grains of about 10 nm and smaller and (iii) the replacement of ecologically damaging galvanic coating processes by high-rate magnetron sputtering and self sputtering.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
1999
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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