Effect of Substrate Temperature on Oblique-Angle Sputtered ZnO:Ga Thin Films

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23640%2F10%3A00503489" target="_blank" >RIV/49777513:23640/10:00503489 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Effect of Substrate Temperature on Oblique-Angle Sputtered ZnO:Ga Thin Films

Original language description

A study of the effect of substrate temperature on oblique-angle sputtered galium- doped zinc oxide (GZO) thin films was carried out. Both the oblique-angle sputtering and the substrate temperature lowered the resistivity of GZO thin films down to 4 x 10-3 ohm cm together with an increase of their optical transmittance over 90%.

Czech name

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Czech description

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Type

D - Article in proceedings

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

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Project

<a href="/en/project/1M06031" target="_blank" >1M06031: Materials and components for environment protection</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2010

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection

ASDAM 2010

ISBN

978-1-4244-8572-7

ISSN

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e-ISSN

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Number of pages

4

Pages from-to

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Publisher name

IEEE Nuclear and Plasma Sciences Society

Place of publication

New York

Event location

Smolenice Castle, Slovakia

Event date

Jan 1, 2010

Type of event by nationality

WRD - Celosvětová akce

UT code for WoS article

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