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Structure and optical properties of the hydrogen diluted a-Si:H thin films prepared by PECVD with different deposition temperatures

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23640%2F10%3A00503615" target="_blank" >RIV/49777513:23640/10:00503615 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Structure and optical properties of the hydrogen diluted a-Si:H thin films prepared by PECVD with different deposition temperatures

  • Original language description

    The paper deals with the hydrogenated amorphous silicon (a-Si:H) films about 300 nm in thickness prepared by using rf-PECVD with hydrogen dilution R = 10 of the silane source gas in the amorphous growth regime onto clean Corning Eagle 2000 glass substrates at different deposition temperatures ranging from 50 to 200 °C. Structural and optical properties of the films were obtained from X-ray diffraction and UV-Vis spectrophotometry. The full width at half maximum of the first scattering peak decreases with increasing of the deposition temperature up to 150 °C and then remains constant. Optical band-gaps are from 1.65 to 1.76 eV, which slightly decrease with increasing deposition temperature, whereas the refractive index increases with increasing deposition temperature. This indicates that the density of the films at higher temperature has increased.

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

    BM - Solid-state physics and magnetism

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/1M06031" target="_blank" >1M06031: Materials and components for environment protection</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2010

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    ASDAM 2010

  • ISBN

    978-1-4244-8572-7

  • ISSN

  • e-ISSN

  • Number of pages

    4

  • Pages from-to

  • Publisher name

    IEEE Nuclear and Plasma Sciences Society

  • Place of publication

    New York

  • Event location

    Smolenice Castle, Slovakia

  • Event date

    Jan 1, 2010

  • Type of event by nationality

    WRD - Celosvětová akce

  • UT code for WoS article