Structural analysis of silicon nanostructures obtained from thermal annealing of PVD deposited SRO/SiO2 multilayers
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23640%2F19%3A43955567" target="_blank" >RIV/49777513:23640/19:43955567 - isvavai.cz</a>
Result on the web
<a href="http://hdl.handle.net/11025/35967" target="_blank" >http://hdl.handle.net/11025/35967</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.vacuum.2019.04.038" target="_blank" >10.1016/j.vacuum.2019.04.038</a>
Alternative languages
Result language
angličtina
Original language name
Structural analysis of silicon nanostructures obtained from thermal annealing of PVD deposited SRO/SiO2 multilayers
Original language description
We report the synthesis and characterization of silicon nanostructures obtained by thermal annealing of silicon-rich oxide/silicon dioxide (SRO/SiO2) multilayers deposited by magnetron sputtering in an argon and oxygen atmosphere. The main motivation to study silicon comes from its success and dominance in microelectronics. Light sources, modulators, waveguides, and logical gates are a few examples of microelectronic materials applications in the various photonic devices which have been developed based on silicon nanocrystals. SRO/SiO2 multilayers were deposited by 13.56 MHz radio-frequency magnetron sputtering. The as-deposited multilayers and the crystallized films were investigated using in-situ X-ray diffractometry (XRD), High-resolution transmission electron microscopy (HRTEM) and Secondary ion mass spectrometry (SIMS). Multilayers composed of alternating stacks of amorphous SRO and SiO2 layers were crystallized by thermal annealing in vacuum. The different stages from nucleation until full crystallization were investigated by in situ X-ray diffractometry. XRD in agreement with HRTEM confirmed the presence of silicon crystalline fraction in annealed films. It is calculated that there is 17-25% of crystalline volume fraction in the multilayers after the annealing procedure with density of particles of 2-2.8x1018cm-3. The crystalline fraction obtained consists of nanoparticles, whose average size is 3.5 – 5 nm.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10302 - Condensed matter physics (including formerly solid state physics, supercond.)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2019
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Vacuum
ISSN
0042-207X
e-ISSN
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Volume of the periodical
166
Issue of the periodical within the volume
August 2019
Country of publishing house
GB - UNITED KINGDOM
Number of pages
5
Pages from-to
32-36
UT code for WoS article
000472990900006
EID of the result in the Scopus database
2-s2.0-85064917011