Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO2 layers

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60076658%3A12310%2F17%3A43895392" target="_blank" >RIV/60076658:12310/17:43895392 - isvavai.cz</a>

Alternative codes found

RIV/68378271:_____/17:00486979

Result on the web

<a href="http://aip.scitation.org/doi/10.1063/1.4977823" target="_blank" >http://aip.scitation.org/doi/10.1063/1.4977823</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1063/1.4977823" target="_blank" >10.1063/1.4977823</a>

Result language

angličtina

Original language name

Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO2 layers

Original language description

Angular distribution measurements have been carried out during High Power Impulse Magnetron Sputtering (HiPIMS) of a titanium target and deposition of titanium and titanium oxide films. The HiPIMS system was operated at a repetition frequency f = 100 Hz with a duty cycle of 1%. Langmuir probe diagnostics has been carried out at a distance of 7.5 cm from the target at four different angles with respect to the surface normal of the target. Film properties were investigated by means of SEM, XR, and GIXD, and a dependence of film thickness and crystalline structure on the deposition angle is observed. Published by AIP Publishing.

Czech name

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Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

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OECD FORD branch

10305 - Fluids and plasma physics (including surface physics)

Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2017

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Applied Physics

ISSN

0021-8979

e-ISSN

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Volume of the periodical

121

Issue of the periodical within the volume

17

Country of publishing house

US - UNITED STATES

Number of pages

9

Pages from-to

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UT code for WoS article

000400623700008

EID of the result in the Scopus database

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