Approximations of reflection and transmission coefficients of inhomogeneous thin films based on multiple-beam interference model
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60162694%3AG43__%2F19%3A00555326" target="_blank" >RIV/60162694:G43__/19:00555326 - isvavai.cz</a>
Alternative codes found
RIV/00216224:14310/19:00112003 RIV/00216275:25310/19:39914959
Result on the web
<a href="https://doi.org/10.1016/j.tsf.2019.03.001" target="_blank" >https://doi.org/10.1016/j.tsf.2019.03.001</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.tsf.2019.03.001" target="_blank" >10.1016/j.tsf.2019.03.001</a>
Alternative languages
Result language
angličtina
Original language name
Approximations of reflection and transmission coefficients of inhomogeneous thin films based on multiple-beam interference model
Original language description
A multiple-beam interference model is used to derive approximate formulae for the reflection and transmission coefficients of inhomogeneous thin films exhibiting large gradients of refractive index profiles. It is shown that these formulae are constituted by series containing the Wentzel-Kramers-Brillouin-Jeffreys term and correction terms with increasing order corresponding to number of considered internal reflections inside the films. A numerical analysis enabling us to show the influence of a degree of inhomogeneity on spectral dependencies of reflectance and ellipsometric parameters of inhomogeneous films is performed. Advantages and disadvantages of our approach compared with other approximate approaches are discussed. The optical characterization of a selected non-stoichiometric silicon nitride film prepared by reactive magnetron sputtering onto silicon single crystal substrate is performed for illustration of using our formulae in practice.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10300 - Physical sciences
Result continuities
Project
<a href="/en/project/LO1411" target="_blank" >LO1411: Development of Centre for low-cost plasma and nanotechnology surface modification</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2019
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Thin Solid Films
ISSN
0040-6090
e-ISSN
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Volume of the periodical
692
Issue of the periodical within the volume
December 2019
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
17
Pages from-to
1-17
UT code for WoS article
000499678700004
EID of the result in the Scopus database
2-s2.0-85071177245