Si ohmic contacts on N-type SiC studied by XPS
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F13%3A43895685" target="_blank" >RIV/60461373:22310/13:43895685 - isvavai.cz</a>
Alternative codes found
RIV/60461373:22810/13:43895685
Result on the web
<a href="http://dx.doi.org/10.1016/j.mee.2012.12.019" target="_blank" >http://dx.doi.org/10.1016/j.mee.2012.12.019</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.mee.2012.12.019" target="_blank" >10.1016/j.mee.2012.12.019</a>
Alternative languages
Result language
angličtina
Original language name
Si ohmic contacts on N-type SiC studied by XPS
Original language description
Si ohmic contacts on N-type 4H- and 6H-SiC with contact resistivity comparable with Ni metallizations were prepared. After etching-off of the Si contacts and deposition of new, unannealed ones, good electrical parameters of the original contacts remain preserved. Such unannealed secondary contacts were already successfully created with original Ni or Ni silicide metallizations. An advantage offered by the secondary contacts prepared after the original Si contacts is that they are prepared on a high-quality SiC surface as the original Si does not react with SiC. XPS and AFM analyses were carried out. Under the original Si contacts when they are etched-off there is observed a shift of Si and C peaks to higher binding energies in comparison with a clean,bare SiC surface. After less than 2 nm of the surface layer is sputtered-off the shift disappears. We suggest that preserved electrical parameters after the etching-off of the Si contacts stem from a SiC surface modification.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
CA - Inorganic chemistry
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GAP108%2F11%2F0894" target="_blank" >GAP108/11/0894: Growth and processing of graphene layers on silicon carbide</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2013
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Microelectronic Engineering
ISSN
0167-9317
e-ISSN
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Volume of the periodical
106
Issue of the periodical within the volume
JUN 2013
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
7
Pages from-to
132-138
UT code for WoS article
000319545500026
EID of the result in the Scopus database
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