Graphene prepared on SiC by chemical vapor deposition proces at low temperature
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F19%3A43918971" target="_blank" >RIV/60461373:22310/19:43918971 - isvavai.cz</a>
Result on the web
<a href="https://content.sciendo.com/configurable/contentpage/journals$002fjee$002f70$002f4$002farticle-p329.xml" target="_blank" >https://content.sciendo.com/configurable/contentpage/journals$002fjee$002f70$002f4$002farticle-p329.xml</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.2478/jee-2019-0064" target="_blank" >10.2478/jee-2019-0064</a>
Alternative languages
Result language
angličtina
Original language name
Graphene prepared on SiC by chemical vapor deposition proces at low temperature
Original language description
Graphene preparation by the method of chemical vapour deposition on SiC substrates is described. Despite very low growth temperature (1080 °C) and with use of methane atmosphere, carbon layers in the form of multi-layer graphene were prepared. Graphene quality was verified by means of available analytical methods: Raman spectroscopy, X-ray photoelectron spectroscopy, Van der Paw method.
Czech name
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Czech description
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Classification
Type
J<sub>SC</sub> - Article in a specialist periodical, which is included in the SCOPUS database
CEP classification
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OECD FORD branch
20501 - Materials engineering
Result continuities
Project
<a href="/en/project/GA17-00607S" target="_blank" >GA17-00607S: Complex Artificial Electromagnetic Structures and Nanostructures</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2019
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Electric Engineering (Elektrotechnicky Casopis)
ISSN
1335-3632
e-ISSN
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Volume of the periodical
70
Issue of the periodical within the volume
4
Country of publishing house
SK - SLOVAKIA
Number of pages
3
Pages from-to
329-331
UT code for WoS article
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EID of the result in the Scopus database
2-s2.0-85074698085