Doubly Charged Ion Emission in Sputtering of Monocrystalline Fluorides.

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388955%3A_____%2F02%3A54020127" target="_blank" >RIV/61388955:_____/02:54020127 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Doubly Charged Ion Emission in Sputtering of Monocrystalline Fluorides.
Original language description
Sputtering of monocrystalline CeF3, LaF3 (doped with Eu), CaF2 and CaCeF2 surfaces by Ar+ ions with impact energies 500-5000 eV has been performed. The emission of doubly charged ions Ce2+, La2+, Eu2+ and Ca2+ has been investigated by a quadrupole SIMS,No impact threshold energy was found. Therefore the kinetic model for the formation of doubly charged ions may not be relevant here. The production of singly and doubly charged ions of Ca, La, Eu. and Ce is qualitatively explained by a partial neutralization of their lattice 2+ or 3+ valences. This process may be applicable generally to ion formation in sputtering of fluorides and possibly also of other strongly ionic compounds.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
CF - Physical chemistry and theoretical chemistry
OECD FORD branch
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2002
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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