A pulsed hollow cathode discharge operated in an Ar/N2/O2 gas mixture and the formation of nitric oxide
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388955%3A_____%2F24%3A00599279" target="_blank" >RIV/61388955:_____/24:00599279 - isvavai.cz</a>
Alternative codes found
RIV/68378271:_____/24:00599279
Result on the web
<a href="https://hdl.handle.net/11104/0356804" target="_blank" >https://hdl.handle.net/11104/0356804</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1007/s11090-024-10450-2" target="_blank" >10.1007/s11090-024-10450-2</a>
Alternative languages
Result language
angličtina
Original language name
A pulsed hollow cathode discharge operated in an Ar/N2/O2 gas mixture and the formation of nitric oxide
Original language description
A hollow cathode discharge with a CuNi (Cu50Ni50) cathode was operated in an Ar/N2/O2 gas mixture. The energy distribution of plasma ions is investigated with the help of energy-resolved mass spectrometry. Formation of singly ionised Ar+ and of Cu+ and Ni+ ions is observed in pure argon. With the addition of N2 or O2 gas the additional formation of molecular N+2 or O+2 ions is observed. The intensity of these ions is reduced in the Ar+N2+O2 gas mixture and molecular NO+ ions become the most abundant ionic species. The formation of neutral NO molecules is confirmed by optical emission spectroscopy. Gas samples collected at the exhaust of the vacuum chamber confirm the formation of NO and, additionally, of NO2 molecules.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10403 - Physical chemistry
Result continuities
Project
<a href="/en/project/GA21-04477S" target="_blank" >GA21-04477S: Innovative plasma-chemical and chemical synthesis of nickel-containing mixed oxide catalysts for the oxidation of volatile organic pollutants</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2024
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Plasma Chemistry and Plasma Processing
ISSN
0272-4324
e-ISSN
1572-8986
Volume of the periodical
44
Issue of the periodical within the volume
2
Country of publishing house
DE - GERMANY
Number of pages
16
Pages from-to
1053-1068
UT code for WoS article
001157934000002
EID of the result in the Scopus database
2-s2.0-85184398495