Characteristics of a pulsed hollow cathode discharge operated in an Ar+O2 gas mixture and deposition of copper nickel oxide thin films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F23%3A00573847" target="_blank" >RIV/68378271:_____/23:00573847 - isvavai.cz</a>
Alternative codes found
RIV/00216208:11320/23:10468535 RIV/61989592:15310/23:73620139
Result on the web
<a href="https://doi.org/10.1016/j.vacuum.2023.112272" target="_blank" >https://doi.org/10.1016/j.vacuum.2023.112272</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.vacuum.2023.112272" target="_blank" >10.1016/j.vacuum.2023.112272</a>
Alternative languages
Result language
angličtina
Original language name
Characteristics of a pulsed hollow cathode discharge operated in an Ar+O2 gas mixture and deposition of copper nickel oxide thin films
Original language description
A hollow cathode discharge with a CuNi (Cu50Ni50) cathode is operated inside a vacuum chamber with Ar gas flowing through its nozzle. O2 gas is admitted to the vaccum chamber. Typical Ar+O2 gas pressures are in the range of 2–50 Pa. The energy distribution of plasma ions is investigated with the help of energy-resolved mass spectrometry. Singly charged Ar+ and molecular O+2 ions are the most abundant ionic species. Deposition rate and heat flux to a substrate increase as function of discharge current. At high pressures, the deposition rate is further increased by the directional gas flow, which becomes more focused onto the substrate. Deposited and annealed thin films are analysed by X-ray diffraction and Raman spectroscopy.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2023
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Vacuum
ISSN
0042-207X
e-ISSN
1879-2715
Volume of the periodical
215
Issue of the periodical within the volume
Sept.
Country of publishing house
GB - UNITED KINGDOM
Number of pages
11
Pages from-to
112272
UT code for WoS article
001025992800001
EID of the result in the Scopus database
2-s2.0-85162097249