Laser ion deposition and implantation into different substrates

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389005%3A_____%2F17%3A00475929" target="_blank" >RIV/61389005:_____/17:00475929 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Laser ion deposition and implantation into different substrates

Original language description

High and low intensity lasers generating non equilibrium plasma can be employed to produce ions in the range eV-MeV, suitable for highly localized energy deposition useful for many applications. Multi-energetic metallic ion beams, generated by laser plasma source, can be used to be implanted in different substrates at different depth and fluence. The implanted species, their energy distribution and their current are important parameters, which play a role in the desired compositional, structural, optical mechanical electrical properties of implanted substrates. Multienergetic implantation induced by laser beam can be applied in many fields: to develop advanced hybrid material based on insulator, semiconductors and metals. To monitor on-line and off-line the ion emission, to monitor off-line plasma characterization as well as depth profiles, defect and nanostructures generated in the implanted substrates. The on-line determination and measurement of generated plasma parameters using time-of-flight detectors and electromagnetic deflection systems such as ion collectors, semiconductors, and ion spectrometers will be also presented. Application of multienergetic ion implantation using various laser beams and their potential application on surface layer modification will be presented and discussed.n

Czech name

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Czech description

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Type

J_ost - Miscellaneous article in a specialist periodical

CEP classification

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OECD FORD branch

10306 - Optics (including laser optics and quantum optics)

Project

<a href="/en/project/LM2015056" target="_blank" >LM2015056: Center of Accelerators and Nuclear Analytical Methods</a><br>

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2017

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Zpravodaj ČVS

ISSN

1213-2705

e-ISSN

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Volume of the periodical

25

Issue of the periodical within the volume

1

Country of publishing house

CZ - CZECH REPUBLIC

Number of pages

9

Pages from-to

23-31

UT code for WoS article

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EID of the result in the Scopus database

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