All

What are you looking for?

All
Projects
Results
Organizations

Quick search

  • Projects supported by TA ČR
  • Excellent projects
  • Projects with the highest public support
  • Current projects

Smart search

  • That is how I find a specific +word
  • That is how I leave the -word out of the results
  • “That is how I can find the whole phrase”

High-intensity laser for Ta and Ag implantation into different substrates for plasma diagnostics

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F15%3A00445830" target="_blank" >RIV/68378271:_____/15:00445830 - isvavai.cz</a>

  • Alternative codes found

    RIV/61389005:_____/15:00445830 RIV/44555601:13440/15:43886723

  • Result on the web

    <a href="http://dx.doi.org/10.1016/j.nimb.2014.11.082" target="_blank" >http://dx.doi.org/10.1016/j.nimb.2014.11.082</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1016/j.nimb.2014.11.082" target="_blank" >10.1016/j.nimb.2014.11.082</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    High-intensity laser for Ta and Ag implantation into different substrates for plasma diagnostics

  • Original language description

    In the present work, we performed study of ion implantation into different substrates by using a high-intensity laser at the PALS laboratory in Prague. Multi-energy ions generated by plasma from Ta and Ag targets were implanted into polyethylene and metallic substrates (Al, Ti) at energies of tens of keV per charge state. The ion emission was monitored online using time-of-flight detectors and electromagnetic deflection systems. Rutherford Backscattering Spectrometry was used to characterise the elemental composition in the implanted substrates by ion plasma emission and to provide the implanted ion depth profiling. These last measurements enable offline plasma characterisation and provide information on the useful potentiality of multi-ion species andmulti-energy ion implantation into different substrates. XPS analysis gives information on the chemical bonds and their modifications in the first superficial implanted layers. The depth distributions of implanted Ta and Ag ions were com

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2015

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Nuclear Instruments & Methods in Physics Research Section B

  • ISSN

    0168-583X

  • e-ISSN

  • Volume of the periodical

    354

  • Issue of the periodical within the volume

    JUL

  • Country of publishing house

    NL - THE KINGDOM OF THE NETHERLANDS

  • Number of pages

    4

  • Pages from-to

    56-59

  • UT code for WoS article

    000356193900013

  • EID of the result in the Scopus database

    2-s2.0-84918841873