Thickness of SiO2 thin film on silicon wafer measured by dispersive white-light spectral interferometry

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61989100%3A27350%2F06%3A00016807" target="_blank" >RIV/61989100:27350/06:00016807 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Thickness of SiO2 thin film on silicon wafer measured by dispersive white-light spectral interferometry

Original language description

We present a white-light spectral interferometric technique for measuring the thickness of SiO2 thin film on a silicon wafer. The technique utilizes a slightly dispersive Michelson interferometer with a cube beam splitter and a fibre-optic spectrometer to record channelled spectra in two configurations. In the first, a standard configuration with two identical metallic mirrors, the recorded channelled spectrum is fitted to the theoretical one to determine the effective thickness of the beam splitter made of BK7 optical glass. In the second configuration one of the mirrors is replaced by SiO2 thin film on the silicon wafer and the recorded channelled spectrum is fitted to the theoretical one to determine the thin-film thickness. We consider multiple reflection within the thin-film structure, use the optical constants for all the materials involved in the set-up, and confirm very good agreement between theory and experiment. The technique is applied to four samples with various SiO2 film

Czech name

Tloušťka tenké vrstvy SiO2 na křemíkovém waferu měřená disperzní interferometrií v bílem světle

Czech description

Tloušťka tenké vrstvy SiO2 na křemíkovém waferu měřená disperzní interferometrií v bílem světle

Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BH - Optics, masers and lasers

OECD FORD branch

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Project

<a href="/en/project/GA202%2F06%2F0531" target="_blank" >GA202/06/0531: Reflection and waveguiding effects in magnetic nanostructures</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2006

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

APPLIED PHYSICS B-LASERS AND OPTICS

ISSN

0946-2171

e-ISSN

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Volume of the periodical

84

Issue of the periodical within the volume

3

Country of publishing house

US - UNITED STATES

Number of pages

6

Pages from-to

511-516

UT code for WoS article

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EID of the result in the Scopus database

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