Nanoindentation-induced phase transformation in silicon thin films

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61989592%3A15310%2F13%3A33146233" target="_blank" >RIV/61989592:15310/13:33146233 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.4028/www.scientific.net/KEM.586.112" target="_blank" >http://dx.doi.org/10.4028/www.scientific.net/KEM.586.112</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.4028/www.scientific.net/KEM.586.112" target="_blank" >10.4028/www.scientific.net/KEM.586.112</a>

Result language
angličtina
Original language name
Nanoindentation-induced phase transformation in silicon thin films
Original language description
Nanoindentation-induced phase transformation of amorphous, annealed amorphous and microcrystalline hydrogen-free silicon thin films were studied. Series of nanoindentation experiments were performed with a sharp Berkovich indenter at various unloading rates. The structural changes in indentation deformed regions were examined using Raman spectroscopy. Analyses of indentation curves and Raman spectra suggest that high pressure phases appear more easily in annealed amorphous Si thin films than in microcrystalline ones.
Czech name
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Czech description
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>S - Specificky vyzkum na vysokych skolach

Publication year
2013
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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