Sputtering of a silicon surface: Preferential sputtering of surface impurities

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F67985882%3A_____%2F13%3A00396645" target="_blank" >RIV/67985882:_____/13:00396645 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1016/j.nimb.2012.09.023" target="_blank" >http://dx.doi.org/10.1016/j.nimb.2012.09.023</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.nimb.2012.09.023" target="_blank" >10.1016/j.nimb.2012.09.023</a>

Result language
angličtina
Original language name
Sputtering of a silicon surface: Preferential sputtering of surface impurities
Original language description
We present molecular-dynamics simulations of the sputtering of an impurity atom off a Si 2 x 1 (100) surface by 2 keV Ar ions. The impurity is characterized by its mass and its binding energy to the Si substrate. We find that sputtering strongly decreases with the mass and even more strongly with the binding energy of the impurity atom to the matrix. The velocity of the impurity perpendicular to the surface is reduced with increasing impurity mass and binding energy. In terms of available ionization theories we can conclude that heavier impurities will have a smaller ionization probability
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
JA - Electronics and optoelectronics
OECD FORD branch
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Project
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Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2013
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical
Nuclear Instruments & Methods in Physics Research Section B
ISSN
0168-583X
e-ISSN
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Volume of the periodical
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Issue of the periodical within the volume
303
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
4
Pages from-to
205-208
UT code for WoS article
000320151600048
EID of the result in the Scopus database
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